Customer Testimonials

Product Matrix


GEMStar XT Thermal

GEMStar XT-R P Ready


XT Options

Material Bottles

Load Lock

GLovebox Interface

500°C Heated Platen

Legacy Systems


GEMStar-CAT Dual


GEMStar XT-R™ PEALD Ready Benchtop Thermal ALD System

The GEMStar XT platform is the next generation of the popular GEMStar line of full-feature, benchtop Atomic Layer Deposition Systems

A small, rugged, lightweight machine for heavyweight R&D efforts, GEMStar XT makes optimal use of lab space and research budgets.

Not yet ready for PEALD development, the GEMStar XT-R Thermal Atomic Layer Deposition systems provide the ability to upgrade to full Plasma Enhanced (PEALD) capability in the future.

The GEMStar XT-R Thermal Atomic Layer Deposition system offers 300 °C (500 °C optional) ALD processing through the full range of substrates, including Solar Cell ALD development.

Configured standard with single or dual 200 °C manifold zones, and four or eight high speed material ALD valve ports (one with vapor push technology), two locatable 200 °C material temperature zones and an external gas interface, the GEMStar XT represents one of the most configurable systems in its price range. Pulsed Vapor Push technology controlled by an additional high speed c-seal ALD valve offering a solution for low vapor pressure materials.

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