Customer Testimonials

Product Matrix


GEMStar XT Thermal

GEMStar XT-R P Ready


XT Options

Material Bottles

Load Lock

GLovebox Interface

500°C Heated Platen

Legacy Systems


GEMStar-CAT Dual


Nano-CUBE™ Benchtop Thermal A/B ALD System

The Nano-CUBE Benchtop Atomic Layer Deposition System is designed to deposit superior true A/B ALD films, while being extremely low cost.

A compact reliable machine for heavyweight R&D efforts, the Nano-CUBETM makes optimal use of lab space and research budgets.

The Nano-CUBE Thermal Atomic Layer Deposition system offers 300°C thermal atomic layer deposition (ALD) processing of 100mm cubic volume samples.

A single temperature controlled manifold up to 200°C configured with two high speed c-seal ALD valves, perfect for depositing materials such as AL203. Two optional 200°C material temperature zones are available for materials requiring heating.

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