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About Arradiance
Thank you for your interest in Arradiance
Specializing in Atomic Layer Deposition
Originally founded in 2003 as Emission Systems Inc. to develop patented technology for electron beam lithography using an arrayed field of cold cathode emission tips and micro-channel electron amplification. The company was re-named to Arradiance in 2004
Michael D. Trotter joins Arradiance as Chief Executive Officer in 2016
Molecular Innovation™
Arradiance provides turn-key Atomic Layer Deposition (ALD) solutions. Our cutting-edge hardware is trusted by the World’s leading thin film research teams. Apply your ALD thin films with one of our compact systems or let us do it for you at our on-site rapid turn foundry
Our deposition systems are deployed worldwide developing new technology in
- Clean-E
- E-Storage
- Sensors
- µElectronics
- ղTechnology
- Optoelectronics
- Catalysts
Choose Arradiance as your ALD Technology partner. Contact Arradiance for additional information
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News and Events
News
2024
March 15, 2024 - Improved refractive index of 3D photonic crystals using ALD
Scientists from the UIC and ANL improved the poor refractive index of 3D photonic crystals by sequential infiltration of ZnO in Arradiance GEMStar ALD system
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February 01, 2024 - Enhanced field emission of CNT forests using ALD
Researchers at Hamburg University have used an Arradiance GEMStar XT-P system to deposit electrically conductive titanium nitride as a diffusion barrier for carbon nanotube growth. This allows carbon nanotube forests to be used in vacuum nanoelectonics with much lower voltages, increasing the viability of these promising devices
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January 24, 2024 - ALD process for depositing pure copper (II) oxide
Scientists from Humboldt University of Berlin in Germany developed a novel ALD process for depositing pure copper (II) oxide (CuO), a p-type semiconductor for low power CMOS circuits, sensor and energy conversion applications, using Arradiance GEMStar ALD
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January 10, 2024 - Mitigating First-Cycle Capacity Losses in NMC811 via Lithicone Layers by MLD
Scientists from the Swiss Federal Laboratories for Materials Science and Technology (EMPA) employed molecular layer deposition (MLD) with lithium tert-butoxide to grow lithicone layers in Arradiance GEMStar XT-P directly onto porous nickel-rich Li-Ni-Mn-Co particle electrodes for high-energy-density lithium-ion batteries, mitigating the first-cycle capacity loss
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2023
October 18, 2023 - Superconducting niobium titanium nitride
Arradiance GEMStar XT-P tool helps to grow NbTiN thin films of superconductor–insulator–superconductor (SIS) multilayers for the next-generation superconducting radio frequency (SRF) cavities for more efficient and sustainable state-of-the-art particle accelerators
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June 06, 2023 - ALD intermetallics improves catalytic dehydrogenation of ethane
Scientists from the University of Alabama and Argonne National Laboratory report new progress in creating Pt-Zn intermetallic nano catalyst for dehydrogenation of ethane, using Arradiance GEMStar ALD deposition system
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May 18, 2023 - Unleaded Glass Technology
Resistive glass components for gas chromatography, mass spectrometry, electro-optics, high energy physics, and in medical and defense applications contain reduced lead oxide. We have the solution to eliminate the need for lead in your glass components required by the RoHS Directive 2011/65/EU
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April 20, 2023 - Determination of surface area by ALD
In many fields, the surface area of a material is a key parameter determining its usefulness. For instance, the performance of catalysts, battery and capacitor electrodes, concrete components, and many water filters depends on the surface area. Conventionally, the surface area of materials used for these applications has been measured by the Brunauer, Emmett and Teller (BET) method. This method measures surface area by measuring the mass gain due to adsorption of a gas molecule, typically nitrogen at liquid nitrogen temperatures. This requires costly equipment and may not be available to researchers or companies who need to measure surface area
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March 17, 2023 - Lifetime and performance of Microchannel plate photomultiplier technology for (PANDA)
High-surface area MCP-PMTs demonstrated a lifetime equivalent of > 70 years of detector operation for proton-antiproton annihilation (PANDA) using Arradiance technology High-energy physics experiments at the Facility for Antiproton and Ion Research in Europe (FAIR), which seek to understand how proton-antiproton annihilation (PANDA) works on a more fundamental level, impose demanding requirements on Cherenkov light photon detectors placed inside the magnetic field of the target spectrometer
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January 20, 2023 - Long-life silicon anodes for lithium-ion batteries
Green energy imposes increasing demands on lithium battery capacities, rates, and cycling lifespan. As a result, the electrochemical performance and cost of the battery anode become critical
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2022
October 13, 2022 - MIT.nano adds new instruments to create and analyze at the nanoscale
New tools can accommodate samples from small pieces up to 200 mm wafers
The Arradiance GEMStar XT-DP plasma-enhanced atomic layer deposition (ALD) system was installed at MIT.nano in May. The system is dedicated specifically to deposit high-quality nanometer-scale thin oxide films including aluminum oxide, hafnium oxide, zirconium dioxide, and silicon dioxide. The Arradiance ALD can be used for samples ranging from small pieces up to 200-mm wafers and has a load lock that isolates the deposition chamber from the user, allowing for better contamination control.
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September 13, 2022 - The impact of Atomic Layer Deposition in our world and Arradiance’s contribution to leading edge research
This talk will focus on the attributes of the Arradiance GEMStar PEALD System and how its unique configurability supports some of the most demanding research programs around the world and in user facilities like MIT.nano
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August 25, 2022 - Ecoresorbable and bioresorbable microelectromechanical systems
As microelectromechanical systems (MEMS) devices advance, the possibility of implantable MEMS medical devices promises a world of new diagnostic and treatment options for doctors and their patients. Ecoresorbable and bioresorbable MEMS (eb-MEMS) represent one exciting development
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June 21, 2022 - Desalination of brackish water through low temperature MLD activated membranes
As populations have increased in areas with limited fresh water supplies, desalination has necessarily filled the gap for fresh water for agricultural and domestic use. Most desalination is done by reverse osmosis, which removes most minerals from the water. While remineralizing reverse osmosis water is possible, it is costly. As a result, desalination methods which do not remove beneficial minerals are attractive. Molecular layer deposition (MLD) is a thin film deposition technique that has gained attention in recent years
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April 5, 2022 - Rapid cancer detection supported by GEMStar XT ALD
ALD is a versatile method of depositing thin films and is finding applications beyond the most common semiconductor uses. Nitza Burck et al. in the group of Amit Meller at Technion-IIT in Israel used Arradiance’s GEMStar ALD system to deposit a 15 nm TiO2 film for a novel application: rapid DNA characterization for cancer detection. DNA strands were passed through Nano pores in TiO2 to measure their length, allowing different strands to be distinguished.
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2020-2019
May 2020 - Arradiance is proud to announce GEMStar Quantum
And is a sponsor of the first ever virtual conference on [PALD]. A global digital conference on Particle Atomic Layer Deposition
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April 2020 - Coronavirus (COVID-19) Pandemic Update
Arradiance has implemented appropriate safety protocols to enable our team to return to full operation in order to support our essential customers. As a result, we are open and ready to support your atomic layer deposition needs and solutions including our foundry services.
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March 2020 - Coronavirus (COVID-19) Pandemic Update
Gov. Charlie Baker issued a stay at home advisory, closing all non-essential businesses through April 7, 2020. Following this directive, Arradiance has chosen to adopt a temporary work from home policy.
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October 2019 - Arradiance is Moving and Expanding
We are pleased to inform you that on 09 November 2019, Arradiance will be relocating to an upgraded, professional and modern facility with easy access in Littleton, MA. The remodeled 10,000+ Sqft facility provides us with a large clean room and 4,000 Sqft of manufacturing space.
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January 2019 - Arradiance Issued Two International Patents
Patents cover Nanofilm technology for noiseless low-signal amplification, critical to emerging scientific and commercial applications.
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January 2019 – Arradiance is a Platinum Sponsor of ALD2019
The AVS 19th International Conference on Atomic Layer Deposition (ALD 2019)
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2018-2016
November 2017 – Arradiance and InRedox Team Up
To offer Advanced Functionalized Nanostructured Materials. Arradiance’s formidable Atomic Layer Deposition (ALD) foundry service and InRedox’ world class manufacturing of nanoporous anodic aluminum oxide (AAO) and Nano tubular anodic titanium oxide (ATO) will provide new ALD functionalized Nano ceramics for life sciences, nanotechnology, filtration and separation, energy generation and storage, analytical equipment and many other applications.
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October 2017 – Arradiance and MicroLabs Scientific Partner
To Enable Rapid Nanotechnology Development and Characterization
Coupling Arradiance's formidable Atomic Layer Deposition(ALD) foundry service with the world class analytical and engineering resources of MicroLabs Scientific to provide researchers access to Nanofilm development, characterization and deep expertise.
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July 2017 – Arradiance is a Platinum Sponsor of ALD2017
The AVS 17th International Conference on Atomic Layer Deposition (ALD 2017)
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Jan 2016 – Arradiance LLC announced 73% sales growth for 2015
Manufacturer of the popular GEMStar family of Benchtop Atomic Layer Deposition (ALD) systems for research and light production, today announced an impressive 73% sales growth for 2015 of their highly popular GEMStar family of Benchtop Atomic Layer Deposition (ALD) systems for research and light production. “We are extremely gratified by the market acceptance of our GEMStar XT line of thermal ALD systems. Most notable is the adoption of our new GEMStar XT-P plasma plus thermal system; the world’s only commercial Benchtop, plasma-enhanced tool,” said Arradiance President, Ken Stenton.
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2015-2013
June 2015 – Hamamatsu Photonics K.K. has licensed Arradiance intellectual property
One of the world’s leading producers of photo detectors and imagers today announced that it has licensed certain Arradiance intellectual property for Atomic Layer Deposition (ALD) nanofilms. This revolutionary technology, the subject of 11 issued US patents and several pending US and worldwide patents, is a foundational technology for next generation photomultiplier tubes (PMT) in use at several high energy physics installations worldwide. Photomultiplier tubes are being put to use as high-speed, high-sensitivity optical sensors in an increasingly broad spectrum of applications ranging from medical equipment to industrial fields. Hamamatsu Photonics is renowned for development prowess that provides scientists everywhere with optimized performance, not only in the detection of faint light, ultra-high speed phenomena and other events, but in special applications as well.
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May 2015 – Photek, Ltd. of St Leonards on Sea, UK has licensed Arradiance intellectual property
Today announced that it is licensing the intellectual property of Arradiance, Inc. of Sudbury, MA for use in Nanofilm Microchannel plate (MCP) based imagers and detectors. Arradiance’s revolutionary Nanofilm technology, covered by 11 issued US patents and several pending US and worldwide patents, has been demonstrated to be the foundational technology for the next generation photomultiplier tubes (PMT) at several high energy physics installations worldwide.
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May 2014 - Arradiance today announced their new GEMStar XT™ platform
That builds on the successful GEMStar thermal ALD system and for the first time, integrates remote inductively coupled plasma (ICP) into an economical Benchtop footprint.
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June 2013 - Fiber optics manufacturer Incom has licensed Arradiance intellectual property
Arradiance have entered into a licensing agreement, under which Incom will utilize Arradiance’s proprietary ALD Microchannel plate (MCP) activation process.
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Jan 2013 - Arradiance applies patented Nanofilm technology
In an industry first, Arradiance, Inc. announced today, the demonstration of cryogenic Microchannel Plate (MCP) devices operating at MΩ resistances, enabling MHz data acquisition rates
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2012-2010
July 2012 – Arradiance announced the issuance of two patents
That cover the use of Nanofilm technologies , fundamental to large area detection, that will revolutionize applications in the scientific, homeland security and medical imaging markets. The patent for invention number 8,227,965 describes Microchannel plate (MCP) devices with tunable resistive films. The patent for invention number 8,237,129 describes polymer substrate-based MCP devices for use in fast neutron detection.
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April 2012 – Arradiance announced the issuance of two patents
That covers the use of Nanofilm technology including films deposited using Atomic Layer Deposition as the resistive element in Microchannel amplification devices. These allowances are the latest in a long list of Arradiance patents covering this method of producing Microchannel plates.
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January 2012 – Arradiance today receives their first of order for the GEMStar-8™
Atomic Layer Deposition (ALD) system from the Singapore-MIT Alliance for Research and Technology (SMART). Founded in 2007, SMART’s Interdisciplinary Research Group, Low Energy Electronic Systems has the mission “to initiate disruptive innovation that could establish new semiconductor industries” by working across technological boundaries within an entrepreneurial infrastructure suited to such a task.
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December 2011 – Arradiance has announced partnerships with two world-class organizations internationally
In Europe, Euris Semiconductor Services of Grenoble, France has agreed to represent and support Arradiance’ GEMStar™ line of Benchtop Atomic Layer Deposition systems. HTL Co. Japan Ltd. of Tokyo has agreed to a corresponding role.
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November 2010 - Arradiance today shipped their first GEMStar Atomic Layer Deposition(ALD) System
To the School of Electrical Engineering and Computer Science at Oregon State University. With its capability to process up to 6” diameter wafers using up to eight precursors, GEMStar has the flexibility to deposit atomically thin layers of material on virtually any substrate and was designed with the most challenging high aspect ratio and through-pore deposition applications in mind.
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October 2010 – Arradiance announces the issuance of a patent
And have added to their IP portfolio a U.S. Patent entitled, “Microchannel Plate devices with multiple emissive layers” that acknowledges the novelty of the Company’s core technology. Among the breakthrough claims of the patent is the application of an engineered thin film dynode layer applied to Microchannel plates which enhance their performance in many key areas including higher gain, lower dark noise, and longer effective lifetime.
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June 2010 – Arradiance today announced their powerful new GEMStar™ Benchtop Atomic Layer Deposition (ALD) system
And will speak on the topic at American Vacuum Society’s annual Atomic Layer Deposition Meeting in Seoul, Korea “ALD of SnO2 as the active component of a Plastic Microchannel‐Based Direct Fast Neutron Detector.” The GEMStar, for which Arradiance has already received multiple orders from leading research centers, can be used to deposit thin layers of material on virtually any substrate and was designed with the most challenging high aspect ratio and through‐pore deposition applications in mind.
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June 2010 – Arradiance has been awarded a grant
Under the Department of Energy Small Business Innovation Research (DOE SBIR) program to develop large‐area Microchannel plates for use as an alternative to traditional photomultipliers.
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February 2010 - Arradiance is the recipients of a Small Business Innovation Research (SBIR) grant
From the National Aeronautics and Space Administration (NASA). The goal of the program is to develop new imaging and sensor technology using Arradiance’s proprietary GEM thin film technologies to replace decades-old Microchannel plate (MCP) technology currently used in space imaging and sensing applications.
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2009-2007
July 2009 – Arradiance today unveiled the GEM‐D2 Atomic Layer Deposition (ALD) system
At the American Vacuum Society’s annual Atomic Layer Deposition Meeting in Monterey, CA. The GEM‐D2 can be used to deposit atomically thin layers of material on virtually any substrate and was designed with the most challenging high aspect ratio and through‐pore deposition applications in mind.
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March 2009 - Arradiance demonstrates the world’s first plastic MCP
A Microchannel plate fabricated on a plastic substrate. Microchannel plates are used in numerous imaging and detection applications where high spatial and temporal resolution coupled with high signal to noise ratio are important. Example applications include: space science, biotechnology, analytical instrumentation, homeland security and night vision.
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September 2008 - Advanced materials developer Arradiance has raised $1.75 million
Of a $3.5 million round of funding, and officials hope the infusion of cash will help the company further penetrate a handful of new vertical markets, including night-vision optics and photovoltaic.
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April 2007 - Arradiance today announced that they have closed a new round of financing
With lead investor, Landon T. Clay, Managing Member of East Hill Management Co. LLC of Boston, MA. The terms of the financing were not disclosed. “We are extremely excited about having someone with Landon’s stature in the financial community as an investment partner in Arradiance”, said Arradiance President, Ken Stenton, “Landon brings an appreciation of the needs of an early-stage technology company that will serve us well as we attempt to penetrate crucial semiconductor processing markets”.
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History of Arradiance
Key events
2003 Originally founded as Emission Systems Inc.
The company was co-founded by Ken Stenton, Dr. Harry Lockwood, David R. Beaulieu, and Daniel Behr to develop patented technology for Electron Beam Lithography using field emission by combining Cold Cathode and Micro-Channel Electron Amplification in an array.
2004 Renamed to Arradiance Inc
Arradiance receives first round Venture Capital funding and a DARPA contract to demonstrate feasibility of a novel Field Emission Device With Micro Channel Gain Element
2005 Arradiance demonstrates world’s first Micro-Channel Electron Amplification Array
Using Silicon Wafers for the potential of high-volume, low-cost production
2007 Arradiance demonstrated Nano-engineered ultra-high gain Microchannel plates
Using internally developed Atomic Layer Deposition equipment. Arradiance closed a new round of financing with private investor
2009 Space Sciences Laboratory, University of California, Berkeley confirms
A functional, uniform, and stable MCP using Arradiance ALD Technology
2010 Arradiance Receives NASA SBIR Grant
To develop new imaging and sensor technology using Arradiance’s proprietary GEM thin film technologies. Arradiance Introduces Powerful New GEMStar Benchtop ALD System
2013 Arradiance Licenses Incom
Arradiance’s patented ALD Microchannel plate (MCP) activation process for large-area MCP-photomultiplier tube (PMT) device
2014 Arradiance Introduces GEMStar XT-P
The First Benchtop Thermal and Plasma-Enhanced Atomic Layer Deposition System (PEALD) for material and device Research
2015 Arradiance Licenses Hamamatsu and PHOTEK LTD
Arradiance intellectual property for Atomic Layer Deposition (ALD) nanofilms for next generation photomultiplier tubes (PMT)
2016 Michael D. Trotter joins Arradiance as Chief Executive Officer
Arradiance Inc restructured as Arradiance LLC
2019 Arradiance relocates to Littleton, MA
With 10,000 sqft, a large clean room and 4,000 sqft manufacturing space
2020 Arradiance Introduces GEMStar Quantum
The latest generation of Atomic Layer Deposition Equipment Technology
Testimonials
From our valued customers
“The Texas State University Nanofabrication Research Service Center is extremely pleased with the versatility of our GEMStar XT-DP PEALD System. It contains an extremely generous number of metal organic (4) and oxidizer ports (4) as well as a pulsed vapor push port, and precursor heaters (2) that are all included in the base package. The equipment is compact, economical, easily installed, well documented, and utilizes an intuitive user interface. Arradiance technical staff have rapidly responded to my requests for recipes and new chemistry support. To date we have trained more than 25 users in our shared cleanroom facility who have successfully deposited TiO2, Al2O3, ZnO, Al:ZnO, ZrO2, and/or SnO2 for their various research and course projects.”
Dr. Casey Smith
“The Arradiance GEMStar-XT reactor in my laboratory is consistently producing high quality hole-blocking layer TiO2 film in my perovskite solar cell research. The ALD-based TiO2 layer through GEMStar-XT enables a high power conversion efficiency of 20% repeatedly and I am very pleased with the performance of GEMStar ALD tool.”
Prof. Satoshi Uchida
“Purdue University was one of the earliest adopters of the Arradiance® GEMStar XT-P Plasma PEALD system, which we received in June 2015. Our overall experience with the GEMStar XT-P Plasma system, service and support from Arradiance® has been excellent. We primarily use the system to this point for oxides and metal depositions. The Purdue team was even successful depositing a very challenging Plasma Al film. We would highly recommend that you contact Arradiance® for your ALD or PEALD system and coating needs”
Prof. Chen Yang
“The Arradiance GEMStar-6 reactor has been in use in my laboratory for eight months continuously now and has performed consistently. It has worked from day one, and we have had no downtime at all so far, not even pump oil changes (with the exhaust abatement system). The chamber temperature is well controlled and the films are homogeneous.”
Prof. Julien Bachmann PhD
“The GEMStar-8 ALD system is critical to our nanomaterials for clean energy research. In particular, the particle holder has been working perfectly for ALD coatings on nanostructured materials for Li batteries and fuel cells …… even better than expected.”
Prof. Andy Sun PhD
“We study the properties of biomolecules using various nanoscale systems. This requires the fabrication of uniform ultrathin freestanding membranes, some of which are deposited using our GEMStar ALD system. This system is small, easy to use, low-maintenance, and has been a workhorse for us – it just runs!”
Prof. Meni Wanunu
“GEMStar-6 has everything our lab environment should need in an ALD tool. It is small, flexible and can handle up to six inch wafers. We also like the 1” height of the chamber that accommodates small, three dimensional objects and the port we can use for in-situ metrology. The design appears to be rugged and easy to service.”
Prof. John F. Conley
“I really appreciate how fast you got this done and how helpful you were.”
Mark Ziffer
“Much of our research is based around arrays of vertical nanostructures. The GEMStar ALD system allows us to deposit very uniform metallic and oxide thin films over these structures”
Steve Shepard
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Leadership Team
Management
Michael D. Trotter
Chief Executive Officer
Gargi Vaidya
Director of Operations
Huazhi Li Ph.D
Principal Scientist and Foundry Manager
Chan Im
Production and Procurement Manager
Board of Directors
Thomas M. Clay
Chairman of Arradiance LLC
Managing Member of Epacria Capital Partners
Michael D. Trotter
CEO of Arradiance LLC
David R. Beaulieu
Arradiance Founder, Board of Directors
Managing Member of Fletcher Hill Innovations LLC
Jeff Plante
Board of Directors
Chris Taylor
President of Servantex LLC
Edward O’Neal
Inside Council and Secretary
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Careers at Arradiance
Help us build a better future
Current Openings
None at this time
Arradiance is committed to create a diverse environment and is proud to be an Equal Opportunity Employer
Even if we do not have specific opportunities at this time
Arradiance is always looking for dedicated, talented, and energetic individuals to join our team. If you have a background in Atomic Layer Deposition, Design Engineering, Manufacturing or Sales and Marketing, please don’t hesitate to contact us
Please send your resume and a brief cover letter to HumanResources@Arradiance.com