Our Atomic Layer Deposition (ALD) technology is used by World Leading Researchers. Deposit your thin films with one of our compact Process Systems, or let us do it for you using our on-site rapid turn Coating Service
We provide turn-key Atomic Layer Deposition (ALD) solutions. Our cutting-edge hardware is trusted by World Leading Research teams
Researchers at QDIR, Inc., and Argonne National Laboratory use GEMStar™ ‘s low-temperature soak mode capability to protect mercury telluride colloidal quantum dots from thermal sintering and to increase charge carrier mobility 10-fold
High reflectance X-ray space telescope mirror multilayer ALD optical coatings reduce mechanical stress and deformation, enabling sub-arcsecond resolution in future astronomy missions
University of Arkansas and University of British Columbia scientists use Arradiance GEMStar™ to synthesize CO2-splitting catalyst nanofilms on aluminosilicate wool for use in a dielectric barrier discharge (DBD) plasma reactor
Researchers at Boise State University demonstrate area-selective ALD on Al2O3, TiO2, and HfO2 grown in a Gemstar XT system
University of Valencia and University of Groningen scientists design a perovskite photovoltaic stack using an efficient and uniform electron transport layer using GEMStar XT ALD of tin oxide (SnOx)
Scientists demonstrate the feasibility of cost-effective co-extruded PEM cells for using 3D printed cylindrical titanium structures to serve as the anode and container of the cell. The cathode is a graphite felt coated with platinum, and the anode is coated with iridium, both by ALD using Arradiance GEMStar XT systems
Scientists from the UIC and ANL improved the poor refractive index of 3D photonic crystals by sequential infiltration of ZnO in Arradiance GEMStar ALD system
Researchers at Hamburg University have used an Arradiance GEMStar XT-P system to deposit electrically conductive titanium nitride as a diffusion barrier for carbon nanotube growth. This allows carbon nanotube forests to be used in vacuum nanoelectonics with much lower voltages, increasing the viability of these promising devices
Scientists from Humboldt University of Berlin in Germany developed a novel ALD process for depositing pure copper (II) oxide (CuO), a p-type semiconductor for low power CMOS circuits, sensor and energy conversion applications, using Arradiance GEMStar ALD
Scientists from the Swiss Federal Laboratories for Materials Science and Technology (EMPA) employed molecular layer deposition (MLD) with lithium tert-butoxide to grow lithicone layers in Arradiance GEMStar XT-P directly onto porous nickel-rich Li-Ni-Mn-Co particle electrodes for high-energy-density lithium-ion batteries, mitigating the first-cycle capacity loss
Arradiance GEMStar XT-P tool helps to grow NbTiN thin films of superconductor–insulator–superconductor (SIS) multilayers for the next-generation superconducting radio frequency (SRF) cavities for more efficient and sustainable state-of-the-art particle accelerators
Scientists from the University of Alabama and Argonne National Laboratory report new progress in creating Pt-Zn intermetallic nano catalyst for dehydrogenation of ethane, using Arradiance GEMStar ALD deposition system
Resistive glass components for gas chromatography, mass spectrometry, electro-optics, high energy physics, and in medical and defense applications contain reduced lead oxide. We have the solution to eliminate the need for lead in your glass components required by the RoHS Directive 2011/65/EU
Surface area of a material is key determining its performance for catalysts, battery and capacitor electrodes, concrete components, and water filters. Researchers at Northwestern University developed a way to measure surface area using GEMStar™
High-surface area MCP-PMTs demonstrated a lifetime equivalent of > 70 years of detector operation for proton-antiproton annihilation (PANDA) using Arradiance patented technology
Green energy imposes increasing demands on lithium battery capacities, rates, and cycling lifespan. As a result, the electrochemical performance and cost of the battery anode become critical
The Arradiance GEMStar XT-P plasma-enhanced atomic layer deposition (ALD) system was installed at MIT.nano in May
The 20 nm SiO2 encapsulation layer in this research was deposited using a GEMStar XT-P, a plasma enabled atomic layer deposition system
Researchers at Blaustein Institute for Desert Research present a solution to improve membrane selectivity creating ion selective nanofiltration (NF) with ALD + MLD using a GEMStar XT system
Arradiance’s GEMStar ALD system used to deposit a 15 nm TiO2 film for a novel rapid DNA application for cancer detection. DNA strands were passed through Nano pores to measure their length to distinguished different strands
