What is Atomic Layer Deposition (ALD) ?

Atomic Layer Deposition (ALD)

Sequentially exposes surfaces with pulsed chemical vapors called precursors

ALD exposes a surface sequentially with pulsed chemical vapors ("precursors") separated by a nitrogen purge. A first precursor forms one monolayer of coating by reacting with the substrate surface (usually with OH groups terminating a surface). The next precursor reacts with the surface of the previously formed monolayer and forms another monolayer. Usually two different precursors are used, resulting in binary coating materials (like Al203), although elemental coatings (pure metals etc.) and much more complex compositions are also possible

The number of monolayers of the coating (thickness) can be determined simply by setting the number of sequential pulses. The vapors do not condense on the surface, because the excess vapor is evacuated between the precursor pulses using a nitrogen purge. This means that the coating after each pulse is self-limiting to one monolayer. This allows complex shapes to be coated with atomic precision (the coating thickness inside a porous material will be the same as on its surface!). Due to this and many more remarkable features, ALD is becoming increasingly popular for more and more applications

Arradiance has been at the leading edge of ALD technology for well over a decade

We’ve been at the leading edge of Atomic Layer Deposition (ALD) and Plasma Enhanced Deposition (PEALD) technology for over a decade - manufacturing pioneering Benchtop equipment so that teams like yours can achieve the results they need in less time, with less expense and with greater efficiently

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We provide turn-key Atomic Layer Deposition solutions

Molecular Innovation™

Our cutting-edge hardware is trusted by the World’s leading thin film research teams. Apply your own ALD thin film coatings with one of our compact systems or let us do it for you at our on-site rapid turn foundry

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Atomic Layer Deposition Periodic Table

The inherent strength of ALD technology is the ability to utilize much of the materials available on the periodic table as shown below. In addition, conformality and the ability to adapt to various substrates, shapes and high aspect ratio structures producing uniform, pinhole free single material and nano-laminate coatings has created broad interest in many fields

Arradiance process and equipment technologies were forged in the most challenging ALD Nanofilm environment: electrically functional nanofilms on substrates possessing both high surface areas and high aspect ratios

Molecular Innovation™

Our deposition systems are deployed worldwide developing new technology in

• Clean-E
• E-Storage
• Sensors
• µElectronics
• ղTechnology
• Optoelectronics
• Catalysts

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Molecular Layer Deposition (MLD)

MLD is a gas phase deposition technology

Extending the Toolbox of Gas Phase Deposited Materials with GEMStar XT-D

Molecular Layer (MLD) is a gas phase deposition technique. It can be used to deposit thin conformal organic polymers such as polyamides, polyimides, and polyesters to name a few. Similar to ALD, MLD separates the reaction of co-reacting chemicals into two surface-mediated half reactions separated by a purge step

Some of these organic precursors can react with inorganic precursors

Additionally, some of these organic precursors can react with inorganic precursors from ALD to define a new class of hybrid organic-inorganic thin films. These hybrid materials have properties that range between pure organic and inorganic films, allowing for control over density, refractive index, elastic modulus, and hardness. This research opens the door for films with precisely tuned mechanical, optical, chemical and electrical properties, further extending the range of materials that can be deposited. Given these unique tunable properties, ALD and MLD have found application in a number of difference fields including energy storage, fuel cells, photovoltaics, biotechnology and semiconductors to name a few

With a unique dual manifold design

Patent pending gas distribution

Arradiance’s GEMStar XT-D is the ideal tool for depositing MLD and ALD films. By separating co-reacting precursors within two individually heated manifolds, deposition and film grown only occur within the chamber and not within the manifold lines. This key feature separates the GEMStar- XT-D from other commercially available ALD tools and is the only Benchtop tool capable of safely depositing ALD and MLD films. Furthermore, the compact and small footprint of the GEMStar XT-D takes up minimal lab space and can easily be integrated to any Glovebox making it an ideal tool for air sensitive research