Deposition Systems
Arradiance Deposition Systems
Engineered for world-class performance on a Benchtop
We help transform your ղTechnology vision into new product technology
GEMStar XT™ systems can be configured as single (4 ALD port) or dual (8 ALD port) 200 °C manifolds with four easily locatable ALD bottle material heated zones, and up to four external gas lines. All systems have one port equipped with our Pulsed Vapor Push technology for low vapor pressure materials. Our GEMFlow™ scripting software allows easy creation of jobs for the most complicated Nano laminate films providing real time history of process and equipment parameters
For more information
Please contact Process System Sales
Specializing in Atomic Layer Deposition
Molecular Innovation™
We provide turn-key Atomic Layer Deposition (ALD) solutions. Our cutting-edge hardware is trusted by the World’s leading thin film research teams. Apply your ALD thin films with one of our compact systems or let us do it for you at our on-site rapid turn foundry
Our deposition systems are deployed worldwide developing new technology in
- Clean-E
- E-Storage
- Sensors
- µElectronics
- ղTechnology
- Optoelectronics
- Catalysts
GEMStar XT Deposition Systems
Glovebox Process Systems
Environment isolation
Single, dual, and custom stations available
Glovebox systems includes
- Side and back mounting
- Large and small antechambers
- Integrated Gas Purification system
- PLC Controller and HMI
- GEMStar stand/fames
- Automated antechamber regeneration
- Automated large antechamber Purging
- Vacuum Pump
- Controlled to Less then 1ppm Moisture and Oxygen
GEMStar Quantum
Plasma Enhanced ALD
In addition to GEMStar XT-P
Quantum includes
- All XT-P features
- Three Mass Flow Controlled Auxiliary Gas Inputs
- One Mass Flow Controlled Pulsed Vapor Push Port for low vapor pressure pre-cursors
- Arradiance RGIP™ Control System to safely handle reactive gas inputs for both Thermal and PEALD applications
- GEMFlow™ Control Software with real time user interface
GEMStar XT-P
Plasma Enhanced ALD
A powerful plasma enhanced ALD system
Extending your research and processing requirements to the next level using Plasma Enhanced ALD
XT-P Includes
- All XT features
- 300 Watt air cooled direct Inductively Coupled Plasma (ICP) RF system
- Four metal sealed user selectable Mass Flow Controlled gas inputs
GEMStar XT-R
Thermal ALD
Upgradeable to XT-P
If your current requirements are thermal ALD, and require a future path to PEALD, choose GEMStar XT-R
XT-R Includes
- All XT features
- XT-P Reactor
- Field upgradeable XT-P
GEMStar XT
Thermal ALD
ALD deposition workhorse
Whether you are focused on Solar Cell, biotechnology or energy research
GEMStar XT will deliver on your most demanding requirement
XT includes to name a few
- Reactor temp up to 300°C
- Up to four movable Bottle Heated Zones
- Gas distribution delivery up to 200°C
- Pulsed Vapor Push (PVP™)
- Flow-through and exposure deposition
- Configurable substrate end effectors
- MFC controlled carrier gas input
More about GEMStar Quantum
GEMStar Quantum
When you need to develop new materials using reactive gases
Our latest generation of Atomic Layer Deposition (ALD) Systems resolves demanding applications required to safely handle reactive gases for both Thermal and PEALD
Quantum using Arradiance RGIP™, safely allows Mass Flow controlled injection of reactive process gas (like H2, O2, and NH3) for both Thermal ALD and PEAD in a single process.
Featuring
- Less than of 6 ft^2 (0.6 m^2) footprint
- 100% Air Cooled
- Four Mass Flow Controlled Plasma Gas Inputs
- Three Mass Flow Controlled Auxiliary Gas Inputs
- One Mass Flow Controlled Pulsed Vapor Push Port for low vapor pressure pre-cursors
- Arradiance RGIP™ Control System to safely handle reactive gas inputs for both Thermal and PEALD applications
- GEMFlow™ Control Software with real time user interface
Learn More about GEMStar Quantum>
For more information
Please contact Process System Sales
Popular Options
Additional System Information
Facilities requirements
for our Process Systems
Downloadable information is provided below
These include physical sizes, weights, and electrical power requirements for our current Process Systems
All our Systems are CE Marked, "Watchdog" protected, have an EMO interface. CSA Certification is available on request.
For additional information
Please contact Customer Support
Custom Equipment Solutions
We provide custom systems and options
Let us know what you need
We specialize in Atomic Layer Deposition. If you can’t find exactly what you need in our standard process systems or options
Our engineering team is ready for your challenge!
Please contact Process System Sales
Recommended Vacuum Pumps and Traps
Recommended
Vacuum Pumps and Traps
For GEMStar XT process systems
Engineered to maximize performance and reliability of our GEMStar Systems
The combination of the ARR-EBARA EV-A10 EBARA DRY Pump and our ARR-RD003000 Dry Pump Multi-Trap was engineered in partnership with critical our critical suppliers to provide optimum process performance and low maintenance without sacrificing reliability
This combination is being used in our service chase and even under heavy use, we have eliminated pump failures though power unexpected outages and factory shut downs
ARR-EV-A10-P-EPP
Enhanced Dry Pump Package
Engineered for GEMStar XT and XT-P for optimum process performance, reliability and low pump maintenance cost
Our Enhanced dry Pump Package combines our separate products into a single offering that will minimize your maintenance costs at a great value
ARR-RD003000
Multi-Trap
The Arradiance MULTI-TRAP system is a high capacity, high conductance vacuum inlet trap that protects your Ebara EV-A10 pump against corrosive chemicals and abrasive particles
The system is configured to prevent both ALD induced particles and vapors from causing pump damage leaving a clean pump exhaust