Arradiance and Lotus Applied Technology.

Arradiance is a leading provider of compact, research-grade ALD, plasma-enhanced ALD (PE-ALD), and MLD equipment, including the GEMStar and PRIME platforms. Arradiance also provides rapid-turn foundry coating services and develops new films and chemistries for companies that need ALD’s unique functionality on their substrates. Hundreds of Arradiance systems are used by leading commercial, academic, and government research teams to develop and move into production advanced materials and devices across semiconductors, energy, sensors, microelectronics, and other emerging applications.

Lotus AT is a pioneer in ALD research and thin-film deposition, with expertise in phosphors, dielectrics, and ultra-thin barriers. Serving the semiconductor, electronics, renewables, optics and photonics, and biotech industries, among others, Lotus AT's innovations have regularly defined the leading edge of ALD capabilities for industry.

Arradiance and Lotus AT share an enduring commitment to high-quality and cutting-edge coating technology for customers worldwide. Lotus AT’s technology enabling extremely high deposition speeds, combined with Arradiance’s strength in designing, manufacturing, and servicing hundreds of deployed ALD systems, allows the combined company to offer novel, production-scale ALD solutions to a broader range of customers.

The Lotus AT team continues to operate from its brand-new premises in Hillsboro, Oregon. The people you work with, the equipment, and the processes running on it are unchanged.

With facilities on both coasts of the United States, Arradiance is committed to providing exceptional service to clients regardless of their location.

For service, support, or anything already in progress, continue to use your existing Lotus AT contacts. If you are new to either company, or not sure who to reach, email corporate@arradiance.com and we will route your question to the right person.

Lotus AT has developed unique, patented intellectual property in rapid spatial and roll-to-roll ALD, enabling use cases impractical at the deposition speeds of traditional temporal ALD.

That matters because deposition speed is what has kept ALD largely inside the research laboratory. Films that are straightforward to grow on a benchtop tool become impractical at volume when each cycle is measured in seconds. Spatial ALD changes that arithmetic, and roll-to-roll processing extends it to continuous webs rather than discrete substrates.

Speed is the headline, but it is not the only gain. Because a spatial tool doses precursor continuously into a fixed zone rather than flooding a chamber and pumping most of it away, Lotus AT has demonstrated better than 95% precursor utilization. For the expensive metal-organic chemistries much of ALD depends on, that can impact the economics of a process as much as the deposition rate does.

Lotus AT’s founders began working with ALD in the early 1990s, after Planar Systems acquired Finlux, the Finnish display maker where ALD was first put to commercial use. The team spun out of Planar as Lotus AT in 2007 and has stayed with the field since, through thin-film phosphors and display dielectrics, ultra-thin moisture barriers, and optical filter stacks running to hundreds of layers.

The two companies now have expertise ranging from research-grade instruments to production-scale deposition rates.

Lotus AT’s own site remains the best place to read about its spatial ALD and roll-to-roll technology: lotusat.com.

For questions about the acquisition, or anything that is not a systems or coating enquiry, email corporate@arradiance.com.

If you want to talk about a specific process, substrate, or deposition requirement, use the enquiry form and a specialist will get back to you.

Announced 29 July 2026.